ILR Dependent 180 Days Tier 2 General
Posted: Tue Feb 09, 2021 7:20 pm
Hi All,
I am applying SET(O) Dependent applications for my wife and daughter. I have questions around the recent changes on 180 days absences and updating immigration history on the application.
My dependants have been issued 2 entry clearance one before 11 January 2018 and one after 11 January 2018.
1. Previously, the guidance(Page 10 under PBS and Appendix W dependant partners) was clear stating there is no need to include any absences towards 180 days absence from the UK for the Visa is granted before 11 January 2018. But the current latest guidance was stating that is only for Tier 1 Entrepreneurs. Is the rule changed? My wife has more than 180 days absence on visa issued before Jan 2018.
2. While updating the application, I can see we need to update the immigration history, where we need to update the absences. Do I need to update all the absences for the five years or only the absence on her second visa which is issued after 11 January 2018?
Any help will be much appreciated.
I am applying SET(O) Dependent applications for my wife and daughter. I have questions around the recent changes on 180 days absences and updating immigration history on the application.
My dependants have been issued 2 entry clearance one before 11 January 2018 and one after 11 January 2018.
1. Previously, the guidance(Page 10 under PBS and Appendix W dependant partners) was clear stating there is no need to include any absences towards 180 days absence from the UK for the Visa is granted before 11 January 2018. But the current latest guidance was stating that is only for Tier 1 Entrepreneurs. Is the rule changed? My wife has more than 180 days absence on visa issued before Jan 2018.
2. While updating the application, I can see we need to update the immigration history, where we need to update the absences. Do I need to update all the absences for the five years or only the absence on her second visa which is issued after 11 January 2018?
Any help will be much appreciated.